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Volumn 301-302, Issue SPEC. ISS., 2007, Pages 410-413
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A comparative study of nonpolar a-plane and m-plane AlN grown on 4H-SiC by plasma-assisted molecular-beam epitaxy
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Author keywords
A1. Dislocation; A1. Stacking fault; B1. AlN; B1. Nonpolar; B1. Polytype; B1. SiC
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Indexed keywords
CRYSTAL ORIENTATION;
CRYSTAL STRUCTURE;
EPILAYERS;
HIGH ENERGY ELECTRON DIFFRACTION;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTOR GROWTH;
SILICON CARBIDE;
EPILAYER ORIENTATIONS;
PLASMA-ASSISTED MOLECULAR-BEAM EPITAXY;
SEMICONDUCTOR GROWTH DIRECTIONS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
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EID: 33947307312
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2006.11.287 Document Type: Article |
Times cited : (13)
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References (9)
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