Interface alloying due to Kr-irradiation on Ni/Si system

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 256, Issue 1, 2007, Pages 248-252

  Datta, D ^a,b   Bhattacharyya, S R ^a  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^b Seth Anandram Jaipuria College   (India)

Author keywords

AFM MFM; Ion beam mixing; Nickel silicide; Rapid thermal annealing; SEM EDAX; XRD

Indexed keywords

ALLOYING; ATOMIC FORCE MICROSCOPY; IRRADIATION; NICKEL; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SILICIDES; X RAY DIFFRACTION;

INTERFACE ALLOYING; ION BEAM MIXING; NICKEL SILICIDE; VACUUM ENVIRONMENT;

INTERFACES (MATERIALS);

EID: 33947222479     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.12.031     Document Type: Article

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