Erratum to "Effect of implanted Si concentration on the Si nanocrystal size and emitted PL spectrum" [Nucl. Instr. and Meth. B 256 (2007) 211] (DOI:10.1016/j.nimb.2006.12.005);Effect of implanted Si concentration on the Si nanocrystal size and emitted PL spectrum

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 256, Issue 1, 2007, Pages 211-215

  Ross, G G ^a   Barba, D ^a   Dahmoune, C ^a   Wang, Y Q ^a   Martin, F ^a  

^a INRS EMT   (Canada)

Author keywords

Ion implantation; Luminescence; Si nanocrystals; TEM

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; NANOCRYSTALS; PHOTOLUMINESCENCE; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

DEPTH DISTRIBUTION; ELECTRON-HOLE PAIR; SI NANOCRYSTALS;

ION IMPLANTATION;

EID: 33947217834     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.03.080     Document Type: Erratum

References (20)

1. International Technology Roadmap for Semiconductors, 2005. Available from: .
2. Hirschman K.D., Tsybeskov L., Duttagupta S.P., and Fauchet P.M. Nature 384 VI (1996) 338
3. Canham L.T. Appl. Phys. Lett. 57 (1990) 1046
4. Orbons S.M., Spooner M.G., and Elliman R.G. J. Appl. Phys. 96 (2004) 4650
5. Barba D., Martin F., Dahmoune C., and Ross G.G. Appl. Phys. Lett. 89 (2006) 034107
6. Smirani R., Martin F., Abel G., Wang Y.Q., Chicoine M., and Ross G.G. J. Lumin. 115 (2005) 62
7. Smirani R., Martin F., Abel G., Wang Y.Q., and Ross G.G. Nanotechnology 16 (2005) 32
8. Wang Y.Q., Smirani R., and Ross G.G. Nanotechnology 15 (2004) 1554
9. Wang Y.Q., Smirani R., and Ross G.G. Nanoletters 4 10 (2004) 2041
10. Ross G.G., Smirani R., Levitcharsky V., Wang Y.Q., Abel G., Veilleux G., and Saint-Jacques R.G. Nucl. Instr. and Meth. B 230 (2005) 198
11. Wang Y.Q., Smirani R., and Ross G.G. Appl. Phys. Lett. 86 (2005) 221920
12. Wang Y.Q., Smirani R., Ross G.G., and Schiettekatte F. Phys. Rev. B 71 (2005) 161310R
13. Kanemitsu Y. J. Lumin. 100 (2002) 209
14. Woollam J.A. Variable angle spectroscopic ellipsometry. In: Webster J.G. (Ed). Wiley Encyclopaedia of Electrical and Electronics Engineering (2000), John Wiley & Sons, New York
15. J.F. Ziegler, .
16. Biersack J.P., and Haggmark L.G. Nucl. Instr. and Meth. 174 (1980) 257
17. Windt D.L. Comput. Phys. 12 (1998) 360
18. Polerecky L., Hamrle J., and MacCraith B.D. Appl. Opt. 39 (2000) 3968
19. Kanemitsu Y., Ogaea T., Shiraishi K., and Tageda K. Phys. Rev. B 48 (1993) 4883
20. Jenkins F.A., and White H.E. Fundamentals of Optics. 3rd ed. (1857), McGraw-Hill p. 261