Crystal-ion-slicing lithium niobate film performed by 250 keV 4He ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 256, Issue 1, 2007, Pages 558-560

  Yu, Y C ^a   Chen, C H ^b   Niu, H ^b   Hsu, J Y ^a   Yang, T N ^c  

^a INSTITUTE OF PHYSICS   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c INSTITUTE OF NUCLEAR ENERGY RESEARCH   (Taiwan)

Author keywords

Crystal ion slicing; Ion implantation; Lithium niobate

Indexed keywords

EPITAXIAL GROWTH; ION IMPLANTATION; LITHIUM COMPOUNDS; OPTICAL MICROSCOPY; REACTIVE ION ETCHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; X RAY DIFFRACTION;

CRYSTAL ION SLICING (CIS); ETCHING SELECTIVITY; HYDROFLUORIC ACID ETCHING; LITHIUM NIOBATE;

EPITAXIAL FILMS;

EID: 33947182364     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.12.058     Document Type: Article

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