Kinetic process of phase separation in Co-SiO2 thin films and preparation of mesoporous SiO2 thin films with mesopore channels aligned perpendicularly to substrate surfaces

Vacuum

Volumn 81, Issue 8, 2007, Pages 1003-1011

  Otomo, Junichiro ^a   Kurokawa, Ryo ^a   Takahashi, Hiroshi ^a   Nagamoto, Hidetoshi ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Co Si O thin film; Kinetic Monte Carlo simulation; Mesoporous silica; Phase separation; Self organization; Sputter deposition

Indexed keywords

COBALT; MESOPOROUS MATERIALS; MONTE CARLO METHODS; PHASE SEPARATION; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTER DEPOSITION;

GROWTH STRUCTURES; KINETIC MONTE CARLO SIMULATION; SELF ORGANIZATION;

THIN FILMS;

EID: 33947144598     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.12.007     Document Type: Article

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