Decorrelation of fitting parameters by Mueller polarimetry in conical diffraction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  De Martino, Antonello ^a   Novikova, Tatiana ^a   Arnold, Christophe ^b   BenHatit, Sami ^a   Drévillon, Bernard ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b HORIBA LTD   (Japan)

Author keywords

Diffraction; Etching process control; Grating metrology; Mueller matrix; Scatterometry

Indexed keywords

DIFFRACTION GRATINGS; FERROELECTRIC MATERIALS; LIQUID CRYSTALS; MATHEMATICAL MODELS; OPTICAL SYSTEMS; PARAMETER ESTIMATION;

ETCHING PROCESS CONTROL; GRATING METROLOGY; MUELLER MATRIX; SCATTEROMETRY;

POLARIMETERS;

EID: 33745605497     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654834     Document Type: Conference Paper

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