850 nm wavelength range nanoscale resonant optical filter fabrication using standard microelectronics techniques

Microelectronic Engineering

Volumn 84, Issue 4, 2007, Pages 673-677

  Hernandez, S ^a   Bouchard, O ^a   Scheid, E ^a   Daran, E ^a   Jalabert, L ^a   Arguel, P ^a   Bonnefont, S ^a   Gauthier Lafaye, O ^a   Lozes Dupuy, F ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

CHF3; E beam lithography; Plasma etching; Resonant grating filter; Sub wavelength grating

Indexed keywords

BANDWIDTH; MICROELECTRONICS; MICROSTRUCTURAL EVOLUTION; NANOSTRUCTURED MATERIALS; SILICON;

GLASS SUBSTRATE; RESONANT GRATING FILTER; SUB-WAVELENGTH GRATING;

OPTICAL FILTERS;

EID: 33847685894     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.006     Document Type: Article

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