Synthesis of succinylated poly(4-hydroxystyrene) and its application for negative-tone photoresist

Journal of Applied Polymer Science

Volumn 103, Issue 6, 2007, Pages 3560-3566

  Cho, Hyejin ^a   Kim, Junyoung ^b   Patil, Prashant ^b   Kim, Jun Young ^c   Kim, Tae Ho ^b  

^a Samsung Electro Mechanics   (South Korea)

^b Sungkyunkwan University   (South Korea)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Atom transfer radical polymerization (ATRP); Lithography; Negative tone image; Photoresist; Succinylated poly(4 hydroxystyrene)

Indexed keywords

CROSSLINKING; FREE RADICAL POLYMERIZATION; MOLECULAR WEIGHT; MONOMERS; PHOTOLITHOGRAPHY; SYNTHESIS (CHEMICAL);

ATOM TRANSFER RADICAL POLYMERIZATION (ATRP); CROSSLINKER; NEGATIVE TONE IMAGE; PHOTO ACID GENERATOR (PAG); POLYDISPERSITY; PRECURSOR POLYMER;

PHOTORESISTS;

CHEMICAL MODIFICATION; CROSS LINKING; IRRADIATION; MOLECULAR WEIGHT; MONOMER; POLYMERIZATION; POLYSTYRENE; SYNTHESIS;

EID: 33847419621     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.24979     Document Type: Article

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