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Volumn 1, Issue , 2005, Pages 676-680

Design of superjunction power MOSFET devices using the gradient oxide-bypassed structure

Author keywords

Gradient oxide bypassed; Oxide bypassed; Power MOSFET devices; Superjunction

Indexed keywords

ELECTRIC BREAKDOWN; ELECTRIC FIELDS; ELECTRIC RESISTANCE; OXIDES; SILICON;

EID: 33847354775     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (13)
  • 1
    • 0018618108 scopus 로고
    • Rec. A Parametric Study of Power MOSFETS
    • San Diego, pp, IEEE
    • C.Hu: Rec. A Parametric Study of Power MOSFETS, Power Electronics Specialists conf. San Diego, pp.385-395, 1979 (IEEE, 1979).
    • (1979) Power Electronics Specialists conf , pp. 385-395
    • Hu, C.1
  • 3
    • 0004179432 scopus 로고
    • Semiconductor Power Devices with Alternating Conductivity Type High-Voltage Breakdown Regions
    • US Patent 5216275, June
    • X.-B. Chen, "Semiconductor Power Devices with Alternating Conductivity Type High-Voltage Breakdown Regions", US Patent 5216275, June 1993.
    • (1993)
    • Chen, X.-B.1
  • 6
    • 0035425002 scopus 로고    scopus 로고
    • Oxide-bypassed VDMOS (OBVDMOS): An alternative to superjunction high voltage MOS power devices
    • Y.C. Liang, K.P. Gan and G.S. Samudra, "Oxide-bypassed VDMOS (OBVDMOS): an alternative to superjunction high voltage MOS power devices", IEEE Electron Device Letters, Vol. 22, No. 8, pp. 407-409, 2001.
    • (2001) IEEE Electron Device Letters , vol.22 , Issue.8 , pp. 407-409
    • Liang, Y.C.1    Gan, K.P.2    Samudra, G.S.3
  • 7
    • 33847359666 scopus 로고    scopus 로고
    • X. Yang, Oxide-bypassed Power MOSFET Devices, Chapter 2-3. M. Eng. thesis, National University of Singapore, 2003.
    • X. Yang, "Oxide-bypassed Power MOSFET Devices", Chapter 2-3. M. Eng. thesis, National University of Singapore, 2003.
  • 8
    • 33847406718 scopus 로고    scopus 로고
    • Methods of Forming Power Semiconductor Devices Having Tapered Trench-based Insulating Regions Therein
    • US Patent No. 6,365,462 B2, 2002
    • B.J. Baliga, "Methods of Forming Power Semiconductor Devices Having Tapered Trench-based Insulating Regions Therein", US Patent No. 6,365,462 B2, 2002
    • Baliga, B.J.1
  • 9
    • 33847353404 scopus 로고    scopus 로고
    • Medici 4.1 User's Manual, Avant! Corporation, Fremont, CA, July 1998.
    • Medici 4.1 User's Manual, Avant! Corporation, Fremont, CA, July 1998.
  • 10
    • 0034297791 scopus 로고    scopus 로고
    • 120V Interdigitated-Drain LDMOS(IDLDMOS) on SOI Substrate Breaking Power LDMOS Limit
    • Shuming Xu, K.P. Gan, G.S. Samudra, Y.C. Liang, and Johnny K.O. Sin, "120V Interdigitated-Drain LDMOS(IDLDMOS) on SOI Substrate Breaking Power LDMOS Limit", IEEE Transactions on Electron Devices, Vol. 47, No. 10, pp. 1980-1985, 2000
    • (2000) IEEE Transactions on Electron Devices , vol.47 , Issue.10 , pp. 1980-1985
    • Xu, S.1    Gan, K.P.2    Samudra, G.S.3    Liang, Y.C.4    Sin, J.K.O.5
  • 12
    • 17444378298 scopus 로고    scopus 로고
    • Theoretical Analyses of Oxide-Bypassed Superjunction Power Metal Oxide Semiconductor Field Effect Transistor Devices
    • Y. Chen, Y.C. Liang and G.S. Samudra, "Theoretical Analyses of Oxide-Bypassed Superjunction Power Metal Oxide Semiconductor Field Effect Transistor Devices", Japanese Journal of Applied Physics, Vol. 44, No. 2, pp. 847-856, 2005.
    • (2005) Japanese Journal of Applied Physics , vol.44 , Issue.2 , pp. 847-856
    • Chen, Y.1    Liang, Y.C.2    Samudra, G.S.3
  • 13
    • 0036803509 scopus 로고    scopus 로고
    • A Simple Technology for Superjunction Device Fabrication: Polyflanked VDMOSFET
    • K.P. Gan, X. Yang, Y.C. Liang, G.S. Samudra and Y. Liu, "A Simple Technology for Superjunction Device Fabrication: Polyflanked VDMOSFET", IEEE Electron Device Letters, Vol. 23, No. 10, pp. 627-629, 2002.
    • (2002) IEEE Electron Device Letters , vol.23 , Issue.10 , pp. 627-629
    • Gan, K.P.1    Yang, X.2    Liang, Y.C.3    Samudra, G.S.4    Liu, Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.