Characteristics of Bi4Ti3O12 thin films on ITO/glass and Pt/Si substrates prepared by R.F. sputtering and rapid thermal annealing

Journal of Electroceramics

Volumn 17, Issue 2-4, 2006, Pages 173-177

  Chia, Wei Kuo ^a   Chen, Ying Chung ^a   Yang, Cheng Fu ^b   Young, San Lin ^c   Chiang, Wang Ta ^d   Tsai, Yu Tarng ^d  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

^c HSIUPING INSTITUTE OF TECHNOLOGY   (Taiwan)

^d FORTUNE INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

ACTFEL; Bi4Ti3O12; Perovskite; R.F. magnetron sputtering; RTA

Indexed keywords

CHEMICAL ANALYSIS; GLASS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; PLATINUM; RAPID THERMAL ANNEALING; SUBSTRATES; THIN FILMS;

BI4TI3O12; POLARIZATION CHARACTERISTICS;

BISMUTH COMPOUNDS;

EID: 33847219696     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-006-7063-0     Document Type: Conference Paper

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