Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks

2005 International Semiconductor Device Research Symposium

Volumn 2005, Issue , 2005, Pages 213-214

  Chowdhury, N A ^a   Srinivasan, P ^a   Misra, D ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33847218273     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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