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Volumn 3, Issue , 2005, Pages

Analysis of deep submicron CMOS transistor Vtlin and Idsat versus channel width

Author keywords

Delta width; DW; Inverse narrow width; INW; STI mechanical stress; X stress; Y stress

Indexed keywords

BANDWIDTH; CMOS INTEGRATED CIRCUITS; ELECTRIC CURRENTS; THRESHOLD VOLTAGE;

EID: 33847097493     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/APMC.2005.1606589     Document Type: Conference Paper
Times cited : (13)

References (9)
  • 1
    • 0036932273 scopus 로고    scopus 로고
    • Accurate Modeling of Trench Isolation Induced Mechanical Stress Effects on MOSFET Electrical Performance
    • R. A. Bianchi, G. Bouche and O. Roux-dit-Buisson, "Accurate Modeling of Trench Isolation Induced Mechanical Stress Effects on MOSFET Electrical Performance," International Electron Device Meeting(IEDM), pp.117-120, 2002.
    • (2002) International Electron Device Meeting(IEDM) , pp. 117-120
    • Bianchi, R.A.1    Bouche, G.2    Roux-dit-Buisson, O.3
  • 3
    • 12344268000 scopus 로고    scopus 로고
    • Modeling Mechanical Stress Effect on Dopant Diffusion in Scaled MOSFETs
    • Y-M. Sheu et al., "Modeling Mechanical Stress Effect on Dopant Diffusion in Scaled MOSFETs", IEEE Trans. on Electron Devices, vol.52, no.1, pp30-38, 2005.
    • (2005) IEEE Trans. on Electron Devices , vol.52 , Issue.1 , pp. 30-38
    • Sheu, Y.-M.1
  • 4
    • 1642298162 scopus 로고    scopus 로고
    • Impact of Reducing STI-Induced Stress on Layout Dependence of MOSFET Characteristics
    • M. Miyamoto et al., "Impact of Reducing STI-Induced Stress on Layout Dependence of MOSFET Characteristics," IEEE Transactions on Electron Devices, vol.51, no.3, 2004.
    • (2004) IEEE Transactions on Electron Devices , vol.51 , Issue.3
    • Miyamoto, M.1
  • 5
    • 85020817075 scopus 로고    scopus 로고
    • X. Xi et al., BSIM4.3.0 MOSFET Model User;s Manual, University of California, Berkeley, pp13.1-13.7, 2003.
    • X. Xi et al., "BSIM4.3.0 MOSFET Model User;s Manual", University of California, Berkeley, pp13.1-13.7, 2003.
  • 6
    • 33847105090 scopus 로고    scopus 로고
    • Impact of STI-Induced Stress, Inverse Narrow Width Effect, and Statistical Vth Variations on Leakage Currents in 120 nm CMOS
    • C. Pacha et al., "Impact of STI-Induced Stress, Inverse Narrow Width Effect, and Statistical Vth Variations on Leakage Currents in 120 nm CMOS," Solid-State Device Research Conference (ESSDERC), pp. 397400, 2004.
    • (2004) Solid-State Device Research Conference (ESSDERC) , pp. 397400
    • Pacha, C.1
  • 7
    • 0842288292 scopus 로고    scopus 로고
    • Process-Strained Si (PSS) CMOS Technology Featuring 3D Strain Engineering
    • C. H. Ge et. al., "Process-Strained Si (PSS) CMOS Technology Featuring 3D Strain Engineering," International Electron Device Meeting, pp.73, 2003.
    • (2003) International Electron Device Meeting , pp. 73
    • Ge, C.H.1    et., al.2
  • 8
    • 3943051393 scopus 로고    scopus 로고
    • Electrical Analysis of Mechanical Stress Induced by STI in Short MOSFETs Using Externally Applied Stress
    • C. Gallon et al., "Electrical Analysis of Mechanical Stress Induced by STI in Short MOSFETs Using Externally Applied Stress," IEEE Transactions on Electron Devices, vol.51, no.8, 2004.
    • (2004) IEEE Transactions on Electron Devices , vol.51 , Issue.8
    • Gallon, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.