Vacuum pumping performance comparison of non-evaporable getter thin films deposited using argon and krypton as sputtering gases

Proceedings of the IEEE Particle Accelerator Conference

Volumn 2005, Issue , 2005, Pages 2860-2862

  Liu, Xianghong ^a   Adam, Matthew ^a   He, Yun ^a   Li, Yulin ^a  

^a Newman Laboratory for Elementary Particle Physics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON YIELD; FILM COMPOSITION; VACUUM PUMPING;

ELECTRONS; KRYPTON; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; THIN FILMS; VACUUM CLEANERS;

VACUUM PUMPS;

EID: 33847095623     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PAC.2005.1591294     Document Type: Conference Paper

References (4)

1. Y. Li and S. Ho, Proceedings of the 2003 Particle Accelerator Conference, p. 620.
2. http://www.genplot.com.
3. C. Benvenuti, P. Chiggiato, P. C. Pinto, A. E. Santana, T. Hedley, A. Mongelluzzo, V. Ruzinov, and I. Wevers, Vacuum 60 (2001), p. 57.
4. S. Amorosi, M. Anderle, C. Benvenuti, S. Calatroni, J. Carver, P. Chigiato, H. Neupert, and W. Vollenberg, Vacuum 60 (2001), p. 89.