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Thin Solid Films

Volumn 413, Issue 1-2, 2002, Pages 110-120

Thin Ta films: Growth, stability, and diffusion studied by molecular-dynamics simulations

(2) Klaver, Peter a Thijsse, Barend a

a DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

Simulation; Stability; Tantalum; Thin film

Indexed keywords

CHEMICAL RELAXATION; COMPUTER SIMULATION; DIFFUSION; FILM GROWTH; ION BOMBARDMENT; MOLECULAR DYNAMICS; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; PROBABILITY DENSITY FUNCTION; SURFACE ROUGHNESS; TANTALUM;

PHASE STABILITY;

THIN FILMS;

EID: 0037166503 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00349-8 Document Type: Article

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.