Optical, electrical, and structural properties of sputtered aluminum alloy thin films with copper, titanium and chromium additions

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3363-3372

  Barron, Lance W ^a   Neidrich, Jason ^a   Kurinec, Santosh K ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Aluminum alloy; Dielectric function; Electrical properties; Optical properties; Sputter deposition

Indexed keywords

ALUMINUM ALLOYS; ELECTRIC PROPERTIES; LATTICE CONSTANTS; MICROSTRUCTURE; OPTICAL PROPERTIES; SPUTTER DEPOSITION; SURFACE TOPOGRAPHY; X RAY DIFFRACTION;

DIELECTRIC FUNCTION; INTRABAND ABSORPTION; THERMAL PROCESSING;

THIN FILMS;

EID: 33846934504     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.09.030     Document Type: Article

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