Electrical characterization of semiconducting V and Pd-doped TiO2 thin films on silicon by impedance spectroscopy

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3745-3752

  Domaradzki, J ^a   Nitsch, K ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Doped oxide; Impedance spectroscopy; Titanium oxide; Transparent conducting oxide

Indexed keywords

CAPACITANCE; MAGNETRON SPUTTERING; PALLADIUM; RELAXATION PROCESSES; SILICON; TITANIUM DIOXIDE; TITANIUM OXIDES; VANADIUM;

DOPED OXIDE; IMPEDANCE SPECTROSCOPY; TRANSPARENT CONDUCTING OXIDE;

THIN FILMS;

EID: 33846919402     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.09.042     Document Type: Article

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