Structural, optical and electrical characterization of Co-Pd doped TiO 2 semiconducting thin films sputtered on silicon

Optica Applicata

Volumn 33, Issue 4, 2003, Pages 661-668

  Domaradzki, Jarosław ^a   Prociów, Eugeniusz ^a   Kaczmarek, Danuta ^a   Berlicki, Tadeusz ^a   Kudrawiec, Robert ^a   Misiewicz, Jan ^a   Mielcarek, Witold ^b  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

Heterojunction; Hot target; Magnetron sputtering; Oxide semiconductors; Thin film

Indexed keywords

COBALT COMPOUNDS; COMPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; HETEROJUNCTIONS; HIGH TEMPERATURE EFFECTS; IONS; MAGNETRON SPUTTERING; SEMICONDUCTOR JUNCTIONS; SILICA; TITANIUM DIOXIDE; X RAY DIFFRACTION;

ACCEPTOR IONS; ALIOVALENT DONORS; HOT TARGET; OXIDE SEMICONDUCTORS;

THIN FILMS;

EID: 2442480291     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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