Micro processing on Cr films by Nd:YAG pulsed laser oxidation method

Journal of Materials Processing Technology

Volumn 184, Issue 1-3, 2007, Pages 173-176

  Guo, Zuoxing ^a   Hu, Jiandong ^a   Lian, Jianshe ^a   Chumakov, A N ^b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b B I STEPANOV INSTITUTE OF PHYSICS   (Belarus)

Author keywords

Diffusion; Laser processing; Microstructure; Surfaces; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; DIFFUSION; LASER BEAM EFFECTS; MICROSTRUCTURE; NEODYMIUM LASERS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

DIFFUSION RATES; LASER OXIDATION; LASER PROCESSING; POWER DENSITY;

METALLIC FILMS;

EID: 33846847558     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2006.11.016     Document Type: Article

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