Oxidizing agent concentration effect on metal-assisted electroless etching mechanism in HF-oxidizing agent-H 2 O solutions

Applied Surface Science

Volumn 253, Issue 9, 2007, Pages 4156-4160

  Hadjersi, Toufik ^a  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

Author keywords

Dissolution; Electroless etching; Insoluble solid phase K 2 SiF 6; Silver

Indexed keywords

DISSOLUTION; ETCHING; SCANNING ELECTRON MICROSCOPY; SILVER; SOLUTIONS; SURFACE ROUGHNESS; WATER; X RAY DIFFRACTION;

INSOLUBLE SOLID PHASES; METAL ASSISTED ELECTROLESS ETCHING; OXIDIZING AGENTS;

SILICON;

EID: 33846817370     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.09.016     Document Type: Article

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