Metal-assisted chemical etching of multicrystalline silicon in HF/ Na2S2O8produces porous silicon

Materials Science Forum

Volumn 480-481, Issue , 2005, Pages 139-144

  Hadjersi, T ^a   Gabouze, N ^a   Ababou, A ^b   Boumaour, M ^a   Chergui, W ^a   Cheraga, H ^a   Belhousse, Samia ^a   Djeghri, A ^a  

^a L'Unite de Developpement de la Technologie du Silicium   (Algeria)

^b UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

Author keywords

Metal assisted chemical etching; Optical behaviour; Porous silicon; Surface structure

Indexed keywords

ETCHING; HYDROFLUORIC ACID; POLYSILICON; REFLECTION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SODIUM COMPOUNDS; SURFACE STRUCTURE;

ENERGY DISPERSIVE X-RAY; EXPERIMENTAL CONDITIONS; METAL-ASSISTED CHEMICAL ETCHING; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE SILICON (MC-SI); OPTICAL BEHAVIOUR; POROUS SILICON LAYERS; REFLECTANCE SPECTROSCOPY;

POROUS SILICON;

EID: 33744513400     PISSN: 02555476     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.480-481.139     Document Type: Article

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