Lithography performance of contact holes - Part II. Simulation of the effects of reticle corner rounding on wafer print performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 172-179

  Mack, Chris A ^a   Sauer, Charles ^a   Weaver, Suzanne ^a   Chabala, Jan ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; IMAGING TECHNIQUES; INTEGRATED CIRCUIT MANUFACTURE; MASKS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION;

CONTACT HOLES; PATTERN FIDELITY; PHASE SHIFTING MASKS; RETICLE; WAFER PRINT;

PHOTOLITHOGRAPHY;

EID: 0033675995     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)