CD control: Whose turn is it?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 790-800

  Köstler, Wolfram ^a   Rößiger, Martin ^a   Wege, Stephan ^a   Zell, Thomas ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

CD uniformity; DRAM 300mm; Low k1 lithography; Sampling methods; Systematic effects

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ONLINE SYSTEMS; PROCESS CONTROL; SAMPLING; STATISTICAL METHODS;

CD UNIFORMITY; DRAM 300MM; LOW K1 LITHOGRAPHY; SAMPLING METHODS; SYSTEMATIC EFFECTS;

LIGHT;

EID: 25144477812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598443     Document Type: Conference Paper

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