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Volumn 5040 II, Issue , 2003, Pages 1055-1061

Contact hole MEEF comparison between ALTA and 50KeV written masks

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; MASKS; NANOTECHNOLOGY; OPTICAL VARIABLES MEASUREMENT; SEMICONDUCTOR DEVICE TESTING; SILICON WAFERS;

EID: 0141721864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485494     Document Type: Conference Paper
Times cited : (11)

References (4)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.