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Volumn 5040 II, Issue , 2003, Pages 1055-1061
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Contact hole MEEF comparison between ALTA and 50KeV written masks
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Author keywords
[No Author keywords available]
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Indexed keywords
DIFFRACTION;
MASKS;
NANOTECHNOLOGY;
OPTICAL VARIABLES MEASUREMENT;
SEMICONDUCTOR DEVICE TESTING;
SILICON WAFERS;
CRITICAL DIMENSION;
MASK ERROR ENHANCEMENT FACTOR;
SEMICONDUCTOR LITHOGRAPHY;
PHOTOLITHOGRAPHY;
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EID: 0141721864
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.485494 Document Type: Conference Paper |
Times cited : (11)
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References (4)
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