Enhancing DRAM printing process window by using inverse lithography technology (ILT)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Chu, Chih Wei ^a   Tsao, Becky ^a   Chiou, Karl ^a   Lee, Snow ^a   Huang, Jerry ^a   Liu, Yong ^b   Lin, Timothy ^b   Moore, Andrew ^b   Pang, Linyong ^b  

^a ProMOS Technologies Inc   (Taiwan)

^b Luminescent Technologies Inc   (United States)

Author keywords

Inverse Lithography Technology (ILT); Lithography; RET

Indexed keywords

INVERSE LITHOGRAPHY TECHNOLOGY (ILT); MASK CONSTRAINTS; RET; WAFER SEM IMAGES;

BOUNDARY CONDITIONS; CONSTRAINT THEORY; IMAGE ANALYSIS; INVERSE KINEMATICS; LITHOGRAPHY; OPTICAL DESIGN; POLYSILICON; SCANNING ELECTRON MICROSCOPY;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 33745765206     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657015     Document Type: Conference Paper

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