Optimization of the depth of focus based on the analysis of the diffraction orders in the pupil plane

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 70-77

  Manakli, S ^a,c   Trouiller, Y ^b   Schiavone, P ^c   Rody, Y ^d   Goirand, P J ^a  

^a STMICROELECTRONICS   (France)

^b CEA LETI   (France)

^c CEA GRENOBLE   (France)

^d NXP SEMICONDUCTORS   (Netherlands)

Author keywords

Depth of focus; Diffraction orders; Isofocal; Optical lithography

Indexed keywords

DIFFRACTIVE OPTICS; INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY;

DIFFRACTION ORDERS;

DIFFRACTION;

EID: 0038021008     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00061-3     Document Type: Conference Paper

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