Characterisation of the properties of surface-treated indium-tin oxide thin films

Synthetic Metals

Volumn 101, Issue 1, 1999, Pages 111-112

  Kim, J S ^a   Cacialli, F ^a   Granstrom M ^a   Friend, R H ^a   Johansson, N ^b   Salaneck, W R ^b   Daik, R ^c   Feast, W J ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b LINKÖPING UNIVERSITY   (Sweden)

^c DURHAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFACIAL ENERGY; OXYGEN; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SURFACE ROUGHNESS; SURFACE TREATMENT; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ELECTRIC RESISTANCE; SEMICONDUCTING FILMS; THIN FILMS; VINYL RESINS;

INDIUM TIN OXIDE; SHEET RESISTANCE; WORKFUNCTION MEASUREMENT;

THIN FILMS; CONDUCTIVE PLASTICS;

INDIUM TIN OXIDE; POLYPHENYLENEVINYLENE; WORK FUNCTION MEASUREMENT;

EID: 0032597451     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0379-6779(98)01127-8     Document Type: Article

References (4)

1. C. Y. Chang et al., ULSI Technology (McGraw-Hill, Singapore, 1996).
2. S. Wu, Polymer Interface and Adhesion (Marcel Dekker Inc., New York, 1982).
3. W. J. Feast et al., Synth. Met. 10, 181-191 (1985).
4. J. S. Kim et al., submitted to J. Appl. Phys. (1998).