MgxZn1-xO films grown by remote-plasma-enhanced MOCVD with EtCp2Mg

Journal of Crystal Growth

Volumn 298, Issue SPEC. ISS, 2007, Pages 468-471

  Yamamoto, K ^a   Enomoto, K ^a   Nakamura, A ^a   Aoki, T ^a   Temmyo, J ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

A3. Remote plasma enhanced MOCVD; B1. MgxZn1 xO; B2. Bis ethylcyclopentadienyl magnesium

Indexed keywords

AMORPHOUS FILMS; MAGNESIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE STRUCTURE; THERMOANALYSIS;

ETHYLCYCLOPENTADIENYL MAGNESIUM; GROWTH TEMPERATURE; RADIO-FREQUENCY (RF) POWER; REMOTE-PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR DEPOSITION (RPE-MOCVD);

FILM GROWTH;

EID: 33846456622     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.10.057     Document Type: Article

References (8)

1. Takagi T., Tanaka H., Fujita S., and Fujita S. Jpn. J. Appl. Phys. 42 (2003) L401
2. Ohtomo A., Kawasaki M., Koida T., Masubuchi K., Koinuma H., Sakurai Y., Yoshida Y., Yasuda T., and Segawa Y. Appl. Phys. Lett. 72 (1998) 2466
3. Gruber Th., Kirchner C., Kling R., Reuss F., and Waag A. Appl. Phys. Lett. 84 (2004) 5359
4. Koyama T., Ohmori T., Shibata N., Onuma T., and Chichibu S.F. J. Vac. Sci. Technol. B 22 (2004) 2220
5. Park W.I., Yi G.C., and Jang H.M. Appl. Phys. Lett. 79 (2001) 2022
6. Nakamura A., Yamamoto K., Ishihara J., Aoki T., and Temmyo J. Jpn. J. Appl. Phys. 44 (2005) 7267
7. Fengping Y., Shuisheng J., Ogata K., Koike K., Sasa S., Inoue M., and Yano M. Sci. China Ser. E Eng. Mater. Sci. 47 (2004) 166
8. Nakamura A., Shigemori S., Shimizu Y., Aoki T., and Temmyo J. Jpn. J. Appl. Phys. 43 (2004) 7672