Improved electrical stability and UV emission of zinc oxide thin films prepared by combination of metalorganic chemical vapor deposition technique and post-deposition hydrogen doping

Organic Electronics

Volumn 8, Issue 1, 2007, Pages 51-56

  Myong, Seung Yeop ^a   Lim, Koeng Su ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Electrical stability; Hydrogen doping; Light emitting diode; UV emission; ZnO film

Indexed keywords

DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; HYDROGEN; LIGHT EMITTING DIODES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ULTRAVIOLET RADIATION; ZINC OXIDE;

ELECTRICAL STABILITY; HYDROGEN DOPING; PHOTOLUMINESCENCE SPECTROSCOPY; UV EMISSION;

THIN FILMS;

EID: 33846217415     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2006.10.010     Document Type: Article

References (25)

1. Van de Walle C.G. Phys. Rev. Lett. 85 (2000) 1012
2. Lavrov E.V., Weber J., Borrnert F., Van de Walle C.G., and Helbig R. Phys. Rev. B 66 (2002) 165205
3. McCluskey M.D., Jokela S.J., Zhuraviev K.K., Simson P.J., and Lynn K.G. Appl. Phys. Lett. 81 (2002) 3807
4. Seager C.H., and Myers S.M. J. Appl. Phys. 94 (2003) 2888
5. Lavrov E.V. Physica B 340-342 (2003) 195
6. Lavrov E.V., Börmert F., and Wever J. Phys. Rev. B 71 (2005) 035205
7. Halliburton L.E., Wang L., Bai L., Garces N.Y., Giles N.C., Callahan M.K., and Wang B. J. Appl. Phys. 96 (2004) 7168
8. Strzhemechny Y.M., Nemergut J., Smith P.E., Bae J., Look D.C., and Brillson L.J. J. Appl. Phys. Lett. 94 (2003) 4356
9. Gordon R.G. MRS Bull. 25 8 (2000) 52
10. Baik S.J., Jang J.H., Lee C.H., Cho W.Y., and Lim K.S. Appl. Phys. Lett. 70 (1997) 3516
11. S.Y. Myong, S.J. Baik, K.S. Lim, in: Proceedings of the Second World Conference on Photovoltaic Solar Energy Conversion, Vienna, Austria, EC Joint Research Center, Ispra, 1998, pp. 692-695.
12. Myong S.Y., and Lim K.S. Appl. Phys. Lett. 82 (2003) 3026
13. Myong S.Y., and Lim K.S. Sol. Energ. Mat. Sol. Cells 86 (2005) 105
14. Faÿ S., Feitknecht L., Schlüchter R., Kroll U., Vallat-Sauvain E., and Shah A. Sol. Energ. Mat. Sol. Cells 86 (2005) 385
15. Myong S.Y., Park S.I., and Lim K.S. Thin Solid Films 513 (2006) 148
16. Li X., Keyes B., Asher S., Zhang S.B., Wei S.H., Coutts T.J., Limpijumnong S.L., and Van de Walle C.G. Appl. Phys. Lett. 86 (2005) 122107
17. Wolden C.A., Barnes T.M., Baxter J.B., and Aydil E.S. J. Appl. Phys. 97 (2005) 043522
18. Thonke K., Gruber Th., Teofilov N., Schonfelder R., Wagg A., and Sauer R. Physica B 308-310 (2001) 945
19. Ohashi N., Ishigaki T., Okada N., Taguchi H., Sakaguchi I., Hishita S., Sekiguchi T., and Haneda H. J. Appl. Phys. 93 (2003) 6386
20. Ohashi N., Tanaka J., Ohgaki T., Haneda H., Ozawa M., and Tsurumi T. J. Mater. Res. 17 (2002) 1529
21. Ohashi N., Ebisawa N., Sekiguchi T., Sakaguchi I., Wada Y., Takenaka T., and Haneda H. Appl. Phys. Lett. 86 (2005) 091902
22. Janotti A., and Van de Walle C.G. Appl. Phys. Lett. 87 (2005) 122102
23. Myong S.Y., and Lim K.S. J. Cryst. Growth 293 (2006) 253
24. Jokela S.J., and McCluskey M.D. Phys. Rev. B 72 (2005) 113201
25. Makino T., Segawa Y., Yoshida S., Tsukazaki A., Ohtomo A., and Kawasaki M. Appl. Phys. Lett. 85 (2004) 759