Fabrication of layered self-standing diamond film by dc arc plasma jet chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 1, 2007, Pages

  Chen, G C ^a   Dai, F W ^a   Li, B ^a   Lan, H ^a   Askari, J ^a   Tang, W Z ^a   Lu, F X ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ELECTRIC ARCS; FILM GROWTH; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESIDUAL STRESSES;

BUFFER LAYERS; DIAMOND CRYSTALLINE GRAINS; DIAMOND FILM FABRICATION;

DIAMOND FILMS;

EID: 33846205668     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2409940     Document Type: Article

References (12)

1. Claude A. Klein, Diamond Relat. Mater. 11, 218 (2002).
2. K. Jagannadham, Solid-State Electron. 42, 2199 (1998).
3. M. C. SaWadori, D. R. Martins, R. D. Mansano, P. Verdonck, and I. G. Brown, J. Vac. Sci. Technol. A 23, 1575 (2005).
4. K. Jagannaclham, M. J. Lance, and T. R. Watkins, J. Vac. Sci. Technol. A 22, 1105 (2004).
5. S. Takeuchi, S. Oda, and M. Murakawa, Thin Solid Films 388-389, 238 (2001).
6. N. Jiang, K. Sugimoto, K. Nishimura, Y. Shintani, and A. Hiraki, J. Cryst. Growth 242, 362 (2002).
7. H. W. Xin, Z. M. Zhang, X. Ling, Z. I. Xi, H. S. Shen, Y. B. Dai, and Y. Z. Wan, Diamond Relat. Mater. 11, 228 (2002).
8. F. X. Lu, W. Z. Tang, G. F. Zhong, T. B. Huang, J. M. Liu, G. H. Li, T. L. Lo, Y. G. Zhang, Z. L. Sun, S. M. Du, Q. Y. He, and S. I. Wang, Diamond Relat. Mater. 9, 1655 (2000).
9. C. T. Kuo, J. Y. Wu, C. H. Lin, T. R. Lu, and C. M. Sung, Mater. Chem. Phys. 72, 114 (2001).
10. Z. Y. Zhou, G. C. Chen, W. Z. Tang, and F. X. Lu, Chin. Phys. 15, 980 (2006).
11. W. Tang, C. Zhu, W. Yao, Q. Wang, C. Li, F. Lu, Thin Solid Films 429, 63 (2003).
12. W. J. Zhang and X. Jiang, Appl. Phys. Lett. 68, 2195 (1996).