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Chinese Optics Letters

Volumn 4, Issue 11, 2006, Pages 678-681

Effects of oxygen partial pressure on optical properties of NiOx films deposited by reactive DC-magnetron sputtering

(3) Zhou, Ying a,b Geng, Yongyou a Gu, Donghong a

a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; MAGNETRON SPUTTERING; MORPHOLOGY; OPTICAL PROPERTIES; OPTICAL RECORDING; PARTIAL PRESSURE; REFLECTION; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS;

OPTICAL BAND GAP; OPTICAL CONTRAST; OPTICAL RECORDING MEDIUM; SURFACE MORPHOLOGY; THERMAL STABILITY;

OPTICAL FILMS;

EID: 33846067240 PISSN: 16717694 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (5)

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