Microstructure of Cu2O/Si interfaces, made by epitaxial electrodeposition

Zeitschrift fuer Metallkunde/Materials Research and Advanced Techniques

Volumn 94, Issue 3, 2003, Pages 259-265

  Ernst, Frank ^a   Switzer, Jay A ^b  

^a Case Western Reserve University   (United States)

^b MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

Author keywords

Electrodeposition; Electron microscopy; Epitaxy; Interfaces

Indexed keywords

AMORPHOUS MATERIALS; COPPER OXIDES; CRYSTAL GROWTH; CRYSTAL ORIENTATION; ELECTRODEPOSITION; MICROSTRUCTURE; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

ATOMISTIC STRUCTURE; EPITAXIAL ELECTRODEPOSITION;

INTERFACES (MATERIALS);

EID: 0242443299     PISSN: 00443093     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.030259     Document Type: Article

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