The influence of substrate temperature variation on tungsten oxide thin film growth in an HFCVD system

Applied Surface Science

Volumn 253, Issue 6, 2007, Pages 3317-3325

  Pal, S ^a   Jacob, C ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Structural and optical properties; Substrate temperature variation; Tungsten oxide

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; IMAGE ANALYSIS; SURFACE ROUGHNESS; TUNGSTEN COMPOUNDS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); SUBSTRATE TEMPERATURE VARIATION; TUNGSTEN OXIDE;

THIN FILMS;

EID: 33845795353     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.07.026     Document Type: Article

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