Study of the negative resistance phenomenon in transition metal oxide films from a statistical mechanics point of view

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Jeong, Doo Seok ^a   Choi, Byung Joon ^c   Hwang, Cheol Seong ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Seoul National University   (South Korea)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; NEGATIVE RESISTANCE; PERCOLATION (SOLID STATE); STATISTICAL MECHANICS; TRANSITION METALS;

BONDING ENERGY; DISORDER TRANSITION; HEAT SOURCE; METAL ELECTRODES; TRANSITION METAL OXIDES;

MOS DEVICES;

EID: 33845767503     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2399332     Document Type: Article

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