Numerical optimization of an optical showerhead reactor design for organometallic vapor phase epitaxy

Journal of Crystal Growth

Volumn 297, Issue 2, 2006, Pages 345-351

  Guo, Y ^a   Pitts, O J ^a   Jiang, W Y ^a   Watkins, S P ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

A1. Computer simulation; A1. Fluid flows; A1. Growth models; A1. X ray diffraction; A3. Organometallic vapor phase epitaxy

Indexed keywords

COMPUTER SIMULATION; FLOW OF FLUIDS; METALLORGANIC VAPOR PHASE EPITAXY; OPTICAL SYSTEMS; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; X RAY DIFFRACTION ANALYSIS;

GROWTH MODELS; GROWTH RATE UNIFORMITY; OPTICAL SHOWERHEAD; REACTOR CHAMBER;

CHEMICAL REACTORS;

EID: 33845597859     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.10.200     Document Type: Article

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