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Volumn 2006, Issue , 2006, Pages 1360-1366

Low electrical resistance silicon through vias: Technology and characterization

Author keywords

Conformity; Heterogeneous integration; Silicon through vias; System on wafer (SoW)

Indexed keywords

CHIP SCALE PACKAGES; ELECTRIC INSULATION; ELECTRIC RESISTANCE; ELECTRONICS PACKAGING; RELIABILITY THEORY;

EID: 33845570490     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2006.1645834     Document Type: Conference Paper
Times cited : (31)

References (9)
  • 2
    • 35348914127 scopus 로고    scopus 로고
    • Innovative flip chip solution for System on Wafer concept
    • September Atlanta
    • N. Sillon et al - "Innovative flip chip solution for System on Wafer concept" - 3S workshop - September 2005 - Atlanta.
    • (2005) 3S Workshop
    • Sillon, N.1
  • 3
    • 24644476611 scopus 로고    scopus 로고
    • Wafer level processing of 3D system in package for RF and data applications
    • May 31 - June 3, Orlando, Florida
    • JC Souriau et al - "Wafer Level Processing Of 3D System In Package For RF And Data Applications" - Electronic Components and Technology Conference, May 31 - June 3, 2005, Orlando, Florida
    • (2005) Electronic Components and Technology Conference
    • Souriau, J.C.1
  • 4
    • 4544359901 scopus 로고    scopus 로고
    • SOP: What is it and why? A new microsystems-integration technology paradigm-Moore's law for system integration of miniaturized convergent systems of the next decade
    • may
    • Rao R. Tummala - "SOP: What is it and why? A new Microsystems-Integration Technology Paradigm-Moore's Law for system integration of miniaturized convergent systems of the next decade" - IEEE Transactions On advanced Packaging - Vol 27, No 2, may 2004 - pp 241-249
    • (2004) IEEE Transactions on Advanced Packaging , vol.27 , Issue.2 , pp. 241-249
    • Tummala, R.R.1
  • 5
    • 10444221697 scopus 로고    scopus 로고
    • Process integration of 3D Chip stack with vertical interconnection
    • Las Vegas, Nevada, May
    • K. Takahashi et al - "Process integration of 3D Chip stack with vertical interconnection" - 54th Electronic Components and Technology Conf, Las Vegas, Nevada, May 2004-pp 601-609.
    • (2004) 54th Electronic Components and Technology Conf , pp. 601-609
    • Takahashi, K.1
  • 6
    • 10444270123 scopus 로고    scopus 로고
    • High-performance vertical interconnection for high density 3D chip stacking package
    • Las Vegas, Nevada, May
    • M Umemoto et al - "High-Performance Vertical Interconnection for high density 3D Chip Stacking Package" 54th Electronic Components and Technology Conf, Las Vegas, Nevada, May 2004, pp.616-623.
    • (2004) 54th Electronic Components and Technology Conf , pp. 616-623
    • Umemoto, M.1
  • 7
    • 33845563831 scopus 로고    scopus 로고
    • Through vias technology for System on wafer approach
    • 08 & 09 november
    • D. Henry - C. Gillot - N. Sillon - "Through vias technology for System on wafer approach" - ENCAST Workshop Zurich - 08 & 09 november 2005.
    • (2005) ENCAST Workshop Zurich
    • Henry, D.1    Gillot, C.2    Sillon, N.3
  • 9
    • 33845581195 scopus 로고    scopus 로고
    • Post-process silicon through vias technology with low electrical resistance
    • San José November
    • D. Henry et al - "Post-process silicon through vias technology with low electrical resistance" - IWLPC 2005 - San José November 2005.
    • (2005) IWLPC 2005
    • Henry, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.