Fabrication of nanoelectromechanical resonators using a cryogenic etching technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2769-2771

  Nelson Fitzpatrick, N ^a   Westra, K ^a   Li, P ^b   McColman, S ^a   Wilding, N ^a   Evoy, S ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b Applied Nanotools Inc   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENICS; ETCHING; NANOSTRUCTURED MATERIALS; PASSIVATION; RESONATORS; SILICON WAFERS; TEMPERATURE CONTROL;

CRYOGENIC ETCHING TECHNIQUES; LIQUID NITROGEN; NANOELECTROMECHANICAL RESONATORS; PLASMA REACTORS;

ELECTROMECHANICAL DEVICES;

EID: 33845272153     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366608     Document Type: Article

References (12)

1. B. Ilic, D. Czaplewski, H. G. Craighead, P. Neuzil, C. Campagnolo, and C. Batt, Appl. Phys. Lett. 77, 450 (2000).
2. A. Erbe, R. H. Blick, A. Tilke, A. Kriele, and J. P. Kotthaus, Appl. Phys. Lett. 73, 3751 (1998).
3. Kuo-Shen Chen, A. A. Ayon, Xin Zhang, and S. M. Spearing, J. Microelectromech. Syst. 11, 264 (2002).
4. S. Grigoropoulos, E. Gogolides, A. D. Tserepi, and A. G. Nassiopoulos, J. Vac. Sci. Technol. B 15, 640 (1997).
5. R. Legtenberg, H. Jansen, M. de Boer, and M. Elwenspoek, J. Electrochem. Soc. 142, 2020 (1995).
6. M. J. de Boer, J. G. E. Gardeniers, H. V. Jansen, E. Smulders, M.-J. Gilde, G. Roelofs, J. N. Sasserath, and M. Elwenspoek, J. Microelectromech. Syst. 11, 385 (2002).
7. R. Dussart, J. Micromech. Microeng. 14, 190 (2004).
8. V. Grigaliunas, V. Kopustinskas, S. Meskinis, M. Margelevicius, I. Mikulskas, and R. Tomasiunas, Opt. Mater. (Amsterdam, Neth.) 17, 15 (2001).
9. http://www.oxford-instruments.com/
10. J. Blake, in Encyclopedia of Physical Science and Technology, 3rd ed., edited by, R. Meyers, (Academic, New York, 2002), Vol. 14, pp. 805-813.
11. http://www.microchem.com/
12. D. W. Carr and H. G. Craighead, J. Vac. Sci. Technol. B 15, 2760 (1997).