Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist

2006 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2006 Technical Proceedings

Volumn 3, Issue , 2006, Pages 266-269

  Nuzaihan Md Nor, M ^a   Hashim, U ^a   Halim, N H A ^a   Bajuri, S N M ^a  

^a UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Electron beam lithography; ma N 2405 resist; Nanowire; PMMA; Scanning electron microscope

Indexed keywords

ELECTRON BEAM RESISTS; NANOWIRES; SINGLE ELECTRON TRANSISTORS;

ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTORESISTS; QUANTUM THEORY; SCANNING ELECTRON MICROSCOPY;

TRANSISTORS;

EID: 33845190143     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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