Evaluation of ma-N 2400 series DUV photoresist for electron beam exposure

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 389-392

  Elsner, H ^a   Meyer, H G ^a   Voigt, A ^b   Gruitzner G ^b  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; PLASMA ETCHING; SILICON WAFERS;

NEGATIVE TONE BEHAVIOR;

PHOTORESISTS;

EID: 0033132679     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00113-6     Document Type: Article

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