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Volumn 3, Issue , 2006, Pages 835-838

Dynamic behavior model for high-k MOSFETs

Author keywords

Compact model; Fast charging transient effects; High k; MOSFETs

Indexed keywords

CHARGING (BATTERIES); DATA ACQUISITION; DIELECTRIC MATERIALS; MATHEMATICAL MODELS; NETWORKS (CIRCUITS); TRANSISTORS;

EID: 33845187355     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (8)
  • 1
    • 0033115977 scopus 로고    scopus 로고
    • MOSFET scaling - The driver of VLSI technology
    • Apr.
    • D. L. Critchlow, "MOSFET scaling - The driver of VLSI technology, " Frac. IEEE, vol. 87, pp. 659-667, Apr. 1999.
    • (1999) Frac. IEEE , vol.87 , pp. 659-667
    • Critchlow, D.L.1
  • 3
    • 0842266671 scopus 로고    scopus 로고
    • High-K dielectrics and MOSFET characteristics
    • Jack C. Lee, et. al., "High-K Dielectrics and MOSFET Characteristics," IEDM Tech. Dig., pp. 95-98, 2003.
    • (2003) IEDM Tech. Dig. , pp. 95-98
    • Lee, J.C.1
  • 5
    • 21644465398 scopus 로고    scopus 로고
    • Intrinsic characteristics of high-k devices and implications of fast transient charging effects (FTCE)
    • B. H. Lee, et. al, "Intrinsic characteristics of high-k devices and implications of fast transient charging effects (FTCE), " IEDM Tech. Dig., pp. 859-862, 2004.
    • (2004) IEDM Tech. Dig. , pp. 859-862
    • Lee, B.H.1
  • 6
    • 32044463057 scopus 로고    scopus 로고
    • Impact of oxygen vacancies on High-K gate stack engineering
    • H. Takeuchi, Hui Yung Wong, Daewon Ha, and Tsu-Jae King, "Impact of Oxygen Vacancies on High-K Gate Stack Engineering," IEDM Tech. Dig., pp. 13-15, 2004.
    • (2004) IEDM Tech. Dig. , pp. 13-15
    • Takeuchi, H.1    Wong, H.Y.2    Ha, D.3    King, T.-J.4
  • 7
    • 0037718399 scopus 로고    scopus 로고
    • Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics
    • Feb.
    • A. Kerber, et. al, "Origin of the Threshold Voltage Instability in SiO2/HfO2 Dual Layer Gate Dielectrics, " IEEE Electron Device Lett., vol. 24, pp. 87-89, Feb. 2003.
    • (2003) IEEE Electron Device Lett. , vol.24 , pp. 87-89
    • Kerber, A.1
  • 8
    • 33748621800 scopus 로고
    • Statistics of the recombination of holes and electrons
    • W. Shockley, and W. T. Read, "Statistics of the Recombination of Holes and Electrons," Physical Rev., vol. 87, pp. 835-842, 1952.
    • (1952) Physical Rev. , vol.87 , pp. 835-842
    • Shockley, W.1    Read, W.T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.