Oxygen induced strong green light emission from low-temperature grown amorphous silicon nitride films

Applied Physics Letters

Volumn 89, Issue 22, 2006, Pages

  Huang, Rui ^b   Chen, Kunji ^a   Qian, Bo ^b   Chen, San ^b   Li, Wei ^b   Xu, Jun ^b   Ma, Zhongyuan ^b   Huang, Xinfan ^b  

^a NANJING UNIVERSITY   (China)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LUMINESCENCE; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON NITRIDE; RADIATIVE RECOMBINATION; ROOM TEMPERATURE; THERMAL OXIDATION;

THIN FILMS;

EID: 33751570319     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2399393     Document Type: Article

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