Selective deposition of hafnium oxide nanothin films on OTS patterned Si(100) substrates by metal-organic chemical vapor deposition

IEEE Transactions on Nanotechnology

Volumn 5, Issue 6, 2006, Pages 701-705

  Kang, Byung Chang ^a   Jung, Duk Young ^a   Boo, Jin Hyo ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

HFO2 thin film; Metal organic chemical vapor deposition (MOCVD); Microcontact printing; Selective growth

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; LITHOGRAPHY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOLAYERS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SUBSTRATES; THIN FILMS;

MICROCONTACT PRINTING; NANOTHIN FILMS; SELECTIVE GROWTH; SELF-ASSEMBLED MONOLAYERS (SAM); SOFT LITHOGRAPHY;

HAFNIUM COMPOUNDS;

EID: 33751510894     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2006.881274     Document Type: Article

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