Effect of substrate temperature on structure and electrical resistivity of laser-ablated IrO 2 thin films

Applied Surface Science

Volumn 253, Issue 5, 2006, Pages 2911-2914

  Wang, Chuanbin ^a,b   Gong, Yansheng ^a   Shen, Qiang ^a   Zhang, Lianmeng ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Electrical resistivity; IrO 2 thin films; Laser ablation; Structure; Substrate temperature

Indexed keywords

ELECTRIC CONDUCTIVITY; IRIDIUM COMPOUNDS; LASER ABLATION; MORPHOLOGY; STRUCTURE (COMPOSITION); SUBSTRATES; SURFACE ROUGHNESS; SURFACES;

CRYSTALLITE SIZE; IRO2 THIN FILMS; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33751414877     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.06.031     Document Type: Article

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