메뉴 건너뛰기




Volumn 817, Issue , 2006, Pages 83-91

Fracture of low-k dielectric films and interfaces

Author keywords

Four point bending; Interfacial adhesion; Low k films

Indexed keywords


EID: 33751255076     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2173535     Document Type: Conference Paper
Times cited : (4)

References (16)
  • 5
    • 0019898001 scopus 로고
    • A molecular interpretation of stress corrosion in Silica
    • T. A. Michalske, S. W. Freiman, "A Molecular Interpretation of Stress Corrosion in Silica", Nature, 295, 511-512 (1982).
    • (1982) Nature , vol.295 , pp. 511-512
    • Michalske, T.A.1    Freiman, S.W.2
  • 7
    • 33751228814 scopus 로고    scopus 로고
    • J. Rim, F. Shi, D. Lee, R. Dauskardt, T. Scherban, F. Ohta, K. Abe and S. Jain, in preparation
    • J. Rim, F. Shi, D. Lee, R. Dauskardt, T. Scherban, F. Ohta, K. Abe and S. Jain, in preparation.
  • 10
    • 84977695915 scopus 로고
    • Influence of water vapor on crack propagation in soda -lime glass
    • S. M. Wiederhorn, "Influence of Water Vapor on Crack Propagation in Soda -Lime Glass", J. Amer. Ceram. Soc., 50, 407-414 (1967).
    • (1967) J. Amer. Ceram. Soc. , vol.50 , pp. 407-414
    • Wiederhorn, S.M.1
  • 16
    • 33751210724 scopus 로고    scopus 로고
    • Ph.D. thesis, Stanford University
    • C. Litteken, Ph.D. thesis, Stanford University (2004).
    • (2004)
    • Litteken, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.