Study of silicide contacts to SiGe source/drain

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2268-2271

  Lauwers, A ^a   van Dal, M J H ^b   Verheyen, P ^a   Chamirian, O ^a   Demeurisse, C ^a   Mertens, S ^a   Vrancken, C ^a   Verheyden, K ^c   Funk, K ^d   Kittl, J A ^a  

^a IMEC   (Belgium)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c ASM BELGIUM   (Belgium)

^d ASM Europe BV   (Netherlands)

Author keywords

Ni silicide; NiPt alloy; Pt; SiGe; Thermal stability

Indexed keywords

GERMANIUM COMPOUNDS; MORPHOLOGY; PLATINUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

NI-SILICIDE; NIPT-ALLOY; NIPT-GERMANOSILICIDE; SIGE;

SILICON COMPOUNDS;

EID: 33751247066     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.017     Document Type: Article

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