Meeting future SDE requirements using co-implantation and RTA

Solid State Technology

Volumn 49, Issue 10, 2006, Pages 45-50

  Felch, S B ^a   Graoui, H ^a   Severi, S ^b   Hoffmann, T ^b   Eyben, P ^b   Pawlak, B ^c  

^a APPLIED MATERIALS INC   (United States)

^b IMEC   (Belgium)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION-RETARDING SPECIES; SCANNING SPREADING RESISTANCE MICROSCOPY (SSRM); SOURCE/DRAIN EXTENSIONS; ULTRASHALLOW JUNCTION (USJ);

DIFFUSION; RAPID THERMAL ANNEALING; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

SEMICONDUCTOR DEVICES;

EID: 33751222213     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. The International Technology Roadmap for Semiconductors, 2005, www.itrs.net.
2. 2-Based High-k Dielectrics as a Candidate for Low-Power Applications," Proc. of Symp. on VLSI Technology, pp. 190-191, 2004.
3. P.C. Eyben, S. Severi, R. Duffy, B. Pawlak, W. Vandervorst, "Analysis and Optimization of New Implantation and Activation Mechanisms in Ultra Shallow Junction Implants using Scanning Spreading Resistance Microscopy (SSRM)," to be published in Proc. of MRS Symposium C, Spring 2006.
4. H. Graoui, M. Foad, V. Moroz, "Source and Drain Extension Formation Using Carbon Co-implantation for PMOS Devices," Proc. of Ultra-Shallow Junctions 2005, p. 346, 2005.
5. B.J. Pawlak, T. Janssens, T. Brijs, W. Vandervosrt, E.J.H. Collart, S.B. Felch, N.E.B. Cowern, "Effect of Amorphization and Carbon Co-Doping on Activation and Diffusion of Boron in Silicon," to be published in Appl. Phys. Lett., August 2006.
6. E.J.H Collart, S.B Felch, B.J. Pawlak, P.P. Absil, S. Severi, T. Janssens, W.Vandervorst, "Co-implantation with Conventional Spike Anneal Solutions for 45nm NMOS Ultra-Shallow Junction Formation," J. Vac. Sci. Technol. B 24, 507, 2006.
7. B.J. Pawlak, R. Duffy, T. Janssens, W. Vandervorst, S.B. Felch, E.J.H. Collart, N.E.B. Cowern, "Suppression of Phosphorus Diffusion by Carbon Co-doping," Appl. Phys. Lett., 89, p. 062102, August 2006.