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Volumn 135, Issue 2, 2006, Pages 162-165

Structural and electrical characterization of tantalum nitride thin film resistors deposited on AlN substrates for π-type attenuator applications

Author keywords

Attenuator; Sputtering; Structural properties; Surface diffusion; Tantalum nitride; TCR

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTALLIZATION; ELECTRIC ATTENUATORS; ELECTRIC PROPERTIES; SPUTTERING; TANTALUM COMPOUNDS;

EID: 33751051542     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.08.057     Document Type: Article
Times cited : (26)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.