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Volumn 135, Issue 2, 2006, Pages 162-165
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Structural and electrical characterization of tantalum nitride thin film resistors deposited on AlN substrates for π-type attenuator applications
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Author keywords
Attenuator; Sputtering; Structural properties; Surface diffusion; Tantalum nitride; TCR
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Indexed keywords
ALUMINUM COMPOUNDS;
CRYSTALLIZATION;
ELECTRIC ATTENUATORS;
ELECTRIC PROPERTIES;
SPUTTERING;
TANTALUM COMPOUNDS;
STRUCTURAL PROPERTIES;
SURFACE DIFFUSION;
TANTALUM NITRIDE;
TCR;
THIN FILM DEVICES;
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EID: 33751051542
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mseb.2006.08.057 Document Type: Article |
Times cited : (26)
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References (9)
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