Scanning tunneling microscope study of the morphology of chemical vapor deposited copper films and its correlation with resistivity

Journal of Applied Physics

Volumn 82, Issue 8, 1997, Pages 3797-3807

  Ramaswamy, Geetha ^a   Raychaudhuri, A K ^a   Goswami, Jaydeb ^a,b   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

^b WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ELECTRONS; FILM GROWTH; GRAIN BOUNDARIES; GRAIN GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PHONONS; SCANNING TUNNELING MICROSCOPY; SURFACES; TEMPERATURE;

COPPER FILM; ELECTRON PHONON INTERACTION; GROWTH RATE;

METALLIC FILMS;

EID: 0031244634     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365742     Document Type: Article

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