Cathodoluminescence in transmission electron microscopy

Journal of Microscopy

Volumn 224, Issue 1, 2006, Pages 79-85

  Strunk, H P ^a   Albrecht, M ^b   Scheel, H ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

Author keywords

Cathodoluminescence; Chalcopyrite films; InGaN quantum well homogeneity; Initial electron irradiation damage; Transmission electron microscopy

Indexed keywords

COPPER COMPOUNDS; ELECTRON IRRADIATION; ELECTRONS; GALLIUM ALLOYS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; III-V SEMICONDUCTORS; INDIUM ALLOYS; RADIATION DAMAGE; SEMICONDUCTOR ALLOYS; SEMICONDUCTOR QUANTUM WELLS;

ANALYTICAL TRANSMISSION ELECTRON MICROSCOPE; CHALCOPYRITE FILM; DEFECT DISTRIBUTION; ELECTRON IRRADIATION DAMAGE; INGAN QUANTUM WELL HOMOGENEITY; INGAN QUANTUM WELLS; INITIAL ELECTRON IRRADIATION DAMAGE; MONOCHROMATIC CATHODOLUMINESCENCE; NOVEL INFORMATION; SPECTRA'S;

CATHODOLUMINESCENCE;

ANALYTIC METHOD; ARTICLE; CATHODE LUMINESCENCE; ELECTRON RADIATION; FILM; LIGHT; MICROSCOPE; PRIORITY JOURNAL; RADIATION INJURY; SPECTROMETER; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33750836888     PISSN: 00222720     EISSN: 13652818     Source Type: Journal    
DOI: 10.1111/j.1365-2818.2006.01670.x     Document Type: Article

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