Reactive direct current magnetron sputtering of tungsten oxide: A correlation between film properties and deposition pressure

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2760-2764

  Salinga, Christian ^a   Kappertz, Oliver ^a   Wuttig, Matthias ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Gasochromic switching; Optical coatings; Sputtering; Tungsten oxide

Indexed keywords

CATALYSTS; COMPUTER SIMULATION; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MATHEMATICAL MODELS;

GASOCHROMIC SWITCHING; KELLER-SIMMONS MODEL; SWITCHING KINETICS; X-RAY REFLECTOMETRY;

TUNGSTEN COMPOUNDS;

EID: 33750828400     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.005     Document Type: Article

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