Surface-enhanced Raman spectroscopy of the growth of ultra-thin organosilicon plasma polymers on nanoporous Ag/SiO2-bilayer films

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1266-1274

  Sun, Guoguang ^a   Grundmeier, Guido ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

Author keywords

Enhancement factor; Physical vapor deposition; Plasma polymer film growth; Surface enhanced Raman spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; PLASMAS; PLASTIC FILMS; SPECTROSCOPY; SURFACE TREATMENT;

ELECTROMAGNETIC ENHANCEMENT; FILM THICKNESS; HEXAMETHYLDISILOXANE PLASMA POLYMER FILMS; TRANS-1,2 BIS-(4-PYRIDYL) ETHYLENE MOLECULES;

ULTRATHIN FILMS;

EID: 33750812243     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.027     Document Type: Article

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